Overview
Korea Vacuum Tech, Inc. (KVT) is proud to introduce the
latest revolutionary addition to our product line, the
CVD system.
Chemical Vapor Deposition is a chemical reactive
process used to produce high –purity, high performance
solid materials in a vacuum state. In a typical
CVD process, the water(substrate) is exposed to one or
more volatile precursors which react and / or decompose
on the substrate surface to produce a desired
deposit. Thermal Chemical Vapor Deposition(Thermal
CVD) is a unique form of the CVD process used primarily
to deposit thin lms from a gaseous state(Vapor) to
a solid state on some substrate. Thermal CVD is
dependent upon thermal energy to create of maintain
a chemical reaction.
Features
≻ 3 Zone Furnace for temperature up to 1000℃
≻ Sample size : up to 2”
≻ Easy to sample loading & unloading by loading bar
≻ 3” dia. Quartz Tube
≻ Operation pressure ~ 1Torr
≻ No water cooling
Specifications
ITEM | SPECIFICATIONS |
Dimension | 1990(W) x 850(D) x 1200 (H) |
Weight | 250 kg |
Loading bar | Sample retract & extend |
Substrate | Size : Piece to 2 inch |
Temperature | Heating: up to 1000℃ on substrate Three zone controlled furnace |
Vacuum Pumping | Rotary pump |
Vacuum Gauge | Convection gauge |
Gas Supply | Ar, H2, CH4, N2 MFC |
Pressure control | Auto throttle valve & CDG sensor |
