Korea Vacuum Tech

Overview

Sputter deposition is a technique used to deposit thin films of a material onto a surface

(substrate). Atoms and ions of a given material are made to collide. The resulting

momentum exchange disperses incident ions which further perpetuate activity setting

off collision cascades in the target. This activity drives the sputtering process. When

such cascades recoil and reach the target surface with an energy above the surface

binding energy, and atom can be ejected. If the target is thin on an atomic scale the

collision cascade can reach the back side of the target and atoms can escape the

surface binding energy in transmission. The average number of atoms ejected from the

target per incident ion is called the “sputter yield” and depends on the ion incident

angle, the energy of the ion, the masses of the ion and target atoms, and the surface

binding energy of atoms in the target.

Features

≻ Excellent Thickness Uniformity

        The KVS Series RF&DC Sputtering System provide excellent thickness uniformity of

        resultant films even for substrates that have the same diameter as the sputtering cathode assembly

≻ Full Auto control

        These systems provide the ‘auto button’ to user for convenience of user. Fully automated vacuum

        process control system.

≻ No Loadlock chamber

Overview

Sputter deposition is a technique used to deposit thin films of a material onto a surface

(substrate). Atoms and ions of a given material are made to collide. The resulting

momentum exchange disperses incident ions which further perpetuate activity setting

off collision cascades in the target. This activity drives the sputtering process. When

such cascades recoil and reach the target surface with an energy above the surface

binding energy, and atom can be ejected. If the target is thin on an atomic scale the

collision cascade can reach the back side of the target and atoms can escape the

surface binding energy in transmission. The average number of atoms ejected from the

target per incident ion is called the “sputter yield” and depends on the ion incident

angle, the energy of the ion, the masses of the ion and target atoms, and the surface

binding energy of atoms in the target.

Features

 ≻ Excellent Thickness Uniformity

         The KVS Series RF&DC Sputtering System provide excellent thickness uniformity of resultant films

         even for substrates that have the same diameter as the sputtering cathode assembly

≻ Full Auto control

        These systems provide the ‘auto button’ to user for convenience of user.

        Fully automated vacuum process control system.

≻ Always maintain high vacuum degree in process

        These systems have a process chamber and a loadlock chamber.

        Loadlock chamber is used for sample loading. So process chamber is always maintained high vacuum state.