Motivation for development
This is the beginning of TSP exposure machines, and was composed of a lineup in the form that could laminate and expose a small size of TSP individually when TSP was first introduced in 1999. Patterns of 10㎛ size are possible with the proximity exposure, and duplicate exposure precision is 2㎛. The Takt time of this product depends on the number and arrangement of exposure heads, but its highest Takt time per sheet is 1.3 seconds. It is designed to expose TSP in various sizes.
Main Use : for TSP-manufacturing process
Product Features
① This is a photo lithography equipment for the G2 process of the touch window process.
② It is designed to accommodate the total multi-alignment accuracy process of the BM, ITO, and Mental process.
③ It realizes a high throughput of 1.3 seconds per panel while achieving 10㎛ of fine patterns.
④ It is a proximity exposure machine.
Main Specifications
