Motivation for development
This is an exposure machine to mass-produce TSP. It makes it possible to convert the size of 620mm * 750mm into patterns with dimensions as small as 10㎛ with the proximity method by applying the one-shot module of six-shot stepper of the LCD exposure machine, and the space in proximity between the mask and the product is designed to be 200㎛ or so.
Main Use : for TSP- and LCD-manufacturing process
Product Features
① This equipment adopts the proximity method, and have removed the problems of alignment distortion resulting from hard contact, damage to the mask at the time of contacting the mask and the product, and Takt time, all of which are arising from the existing exposure.
② Available to check the precise starting point in real time and control an exact proximity distance
③ Capable of realizing 10㎛-[on condition of 8㎛ in PR thickness] L/S, despite the proximity exposure method [Realizing a high-performance UV optical system]
④ Capable of contributing to increase in cleanliness in the product lines because it does not require vacuum chamber structures for close adhesion
Main Specifications
