Motivation for development
Commercial equipment developed to meet the needs of customers who request the concomitant use of both PSR and DFR work processes Capable of making the PSR work process fast by adopting a capacity of 10kW instead of 8kW of the existing lamps to improve the operability, and designed to do DFR work at the same time by switching into 5kW, if necessary.
Main Use : For PSR. of the PCB process and FPCB-manufacturing process
Product Features
① This equipment is an exposure device used for the PSR, flexible exposure process of PCB-manufacturing process.
② Operational efficiency has been improved due to the achievement of high-efficiency UV flux and high-level beam uniformity
③ Allowing for the development of efficient fine patterns by realizing semi-collimation of UV beams or rays
Main Specifications
