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System Engineering Mega Solution

Semi conductor equipment, Display equipment and Material handling automation equipment manufacturer
Name

MICHELAN C3

Model MICHELAN C3
Series Semiconductor Equipment
Product Description

Overview

ICP Type Plasma Etcher for WLP, SOH, DPT Etching Process 


Feature

Process Performance

- Specialized Critical Etch Process
   : DRAM, Flash, 3D NAND and Logic Applications
- Fast Etch / Various Control Knobs for Uniform Etch Rate
- High Mask Selectivity / High Accuracy of CD Control
- Low Particle / Verticle Etching

Productivity / Hardware
- Cluster Transfer Module : Max. 6 Chambers
- Quadra Type Transfer Module : Max. 6 Chambers (All for Processing)
- ICP Type Etcher : High Plasma Density
- RF Sync Pulse Function : High Aspect Ratio
- Multi-Zone ESC Heating and 3Z-Tunale : Gas Radial Uniformity Control
- Low C.o.O / Long MTBC
- High Throughput