Overview
Single Wafer Wet Clean/PR Strip for High Grade Process
Feature
Process Performance
- High Grade Process (26nm)
Productivity / Hardware
- Contamination Free Clean by NIC Bowl
- New S2-Aerosol : High-Velocity / Uniformity Droplet
- Smart System : APAC (Auto Flow Control), Smart Equipment Analysis System, Auto Inspection System
- Energy Efficiency Rating : Class 1