Overview
Single Wafer Wet Clean/PR Strip Equipment for High Grade Process
Feature
Process Performance
- High Speed Robot Technology
- High Grade Process (19nm)
- High Temperature SPM Process Over 150℃
Productivity / Hardware
- Customized Chamber Configuration : 6, 9 or 12 Chambers
- State of the art Particle Improvement Technology
- User-Convenience (Vision Inspection, Tool Matching)
- Equipment Analysis and Diagnosis System
