Overview
ㆍSystem for absorption of heat generated from the semiconductor and FPD manufacturing processes and to supply of Working Fluid (Coolant) with consistent temperature required for the process by cooling the Working Fluid(Coolant) by using Peltier element
ㆍAreas of application Etch
Characteristics
ㆍThermoelectric cooling using the Peltier effect
ㆍCan be installed under grating
ㆍEco-friendly system
ㆍFast response speed and ease of control
ㆍMinimal installation space
ㆍMinimization of use of working fluid (coolant)
Overview
ㆍSystem for absorption of heat generated from the semiconductor and FPD manufacturing processes and to supply of Working Fluid (Coolant) with consistent temperature required for the process by cooling the Working Fluid(Coolant) by using Peltier element
ㆍAreas of application Etch
Characteristics
ㆍThermoelectric cooling using the Peltier effect
ㆍCan be installed beneath process equipment
ㆍEco-friendly system
ㆍFast response speed and ease of control
ㆍMinimal installation space
ㆍMinimization of use of working fluid (coolant)
Overview
ㆍPeltier element and System that uses low-temperature process water (PCW) to cool working fluid (colant, etc.) and absorb the heat arising from semiconductor and FPD manufacturing processes, supplying working fluid (coolant) at a constant temperature required in processes
ㆍAreas of application Etch
Characteristics
ㆍThermoelectric cooling using the Peltier effect
ㆍElectric Type + Heat Exchanger Type
ㆍEco-friendly system
ㆍFast response speed and ease of control
ㆍMinimal installation space
ㆍMinimization of use of working fluid (coolant)