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MIS

Semi conductor manufacturing equipment manufacturer, Auto Decaper, Track System, Vacuum Valve and more
Name

MIS Wet Etch

Model DW-07
Series Semiconductor Equipment
Product Description

Function & Features 


- Automatic chemical decapsulation equipment 
- The functions of etching, heating, acetone cleaning, and drying available 
- Protecting workers from harmful chemicals 
- Minimizing damage etching of copper in the case of copper wired IC 
- Minimizing the damage on the ball or the tape at the bottom of a package 
- Fast, safe, and efficient decapsulation
- Dual heating (MIS-specialized technology) 
- More precise, faster, and safer decap possible. 
- Repetitions made simple using recipe files 
- Consumable gaskets are unnecessary and very small amount of etching chemical is used. 
- Expanded decap possibility for various sizes and patterns of packages 
- Minimal maintenance and repair costs, and long lifecycles
- LED Chip Package Decap available

 

Specification

Item Description
Dimension 740(W) x 600(D) x 1650(H) mm
Weight Approx. 180 kg
Procedure Etching, Heating, Cleaning
Handling IC Size 2x2 mm ~ 50x50 mm
Etchant Fuming Nitric Acid, Sulfuric Acid, Fuming Sulfuric Acid
Cleaning Solution Acetone
Heating Temperature 1. Beam Heater : (Room Temp.)~ 400 °C
2. Jig Heater : (Room Temp.)~ 250 °C
Free Control by Dual Heating System
Process Time Etching~Cleaning: 3~15 min. (Average Time)
Utility Roted Voltage : AC 220V/110V, 1 Phase
Roted Current : 15A
Roted Frequency : 50 ~ 60 Hz
Air Pressure : 6kg/㎠ (bar)
Fume Exhaust Line
De-Ionized Water Supply / Drain
Program Microprocessor Control Panel