Carbozen ™ -C(PECVD : Plasma Enhanced CVD) SERIES is in the CVD method which uses plasma and it demands decompose ion gas, utilizing a generated glow discharge.
System Specification
| Chamber Size | Custom-made |
| Working Gas | Mass flow control system Ar · O2 · C2H2 · CH4 · C6H6 · etc |
| The Initial Vaccum Degree |
~10-6Torr |
| Bias Power | 13.56 MHz [RF] |
| Device Operation | Automatic / Semi-automatic |
| Cooling System | Water cooled |
Advantages of CARBOZEN™-C
• Enable to form a of high purity coating layer
• Possivle to form various coating layers by source gas
• High deposition rate and uniformity ro large-areas
• Easy to control and possible mass production
• Lowtemperature for ion plating
Applications
Plane-DLC
ight guide plates, CD molds and Coin Heads for specular display components.
Inner DLC
Compressor parts for refrigerators and chemical plant pipes
