The optical cleaning technology that uses deep UV is called UV/O₃cleaning because it uses UV and ozone that is discharged by UV. UV/O₃cleaning technology is dry cleaning that doesn’t use any medicine so it is very effective for precision cleaning. Its advantage is that it doesn’t damage the surface of a subject. It is being settled down as an important technology for cleaning semiconductor wafer and TFT glass board, and for reforming the surface. 

UV/O₃cleaning is applied under normal temperature. It is easy to operate and treat. And further, it doesn’t cost a lot. It is very effective for removing low-concentrated pollutants so it can bring ultra-clean surfaces. Compared with the existing atmospheric pressure plasma or eximer lamps, it is easily expandable and requires a small amount of investment. It is available for not only small boards, but also for large boards of over 1800mm . 
  
Details of the applications are, 
1. Hydrophilic treatment and reforming for glass surfaces 
2. Hydrophilic treatment and reforming for metal surfaces
3. Reforming register surfaces
4. Removing the remaining films after register development
5. Washing register
6. Annealing and reforming oxidation
7. Creating oxidation