The Albatross™ : Our high density and low electron temperature plasma offers many advantages for plasma surface treatment processes. Our patented, dual rotated ICP plasma antenna technology, surrounding a quartz chamber, provides excellent film uniformity, very clean treatment and wide process range to meet every customer’s needs.
Key Features
- Dual Rotated Spiral ICP Antenna Plasma Source
- Quartz Chamber for Metal Contamination Free Process
- High Temperature Process up to 600°C
- High Vacuum Configuration w/Turbo Molecular & Dry Pumps
Benefits
- Damage Free Plasma
- Lower Particle Generation
- Wide Process Window
- Thick Plasma Oxidation
Applications
