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MEERE COMPANY

Semi conductor, LCD equipment manufacturer, Grinder, USC, Loaer and more
Name

Semiconductor Equipment

Series Semiconductor Equipment
Product Description

 

MEERE COMPANY Semiconductor Equipment MEERE COMPANY Semiconductor Equipment  1

◎ Main features

- Minimize working time through Pre Aligner 
- Minimize standby time through One Touch operation 
- Realize various functions such as alignment, dispersion, amalgamation 
- Minimize time to maintain equipment through auto tuning function of OCR 
- Convenient monitoring and operation using Touch Panel

◎ Main uses 

- Equipment used for WLP of semiconductor, sort processes based on wafer Unique identification mark reading wafer

◎ Target market

- Semi-conductor

 

MEERE COMPANY Semiconductor Equipment  2

◎ Main features

- Convenient operation with user oriented design 
- Maximize work efficiency using various options available 
- High level of precision and stability

◎ Main uses 

- Automatically pack or unpack wafer in Wafer Cassette into exclusive wafer jar box, Wafer is packed into Jar Box with Wafer Sheet by Clean Robot

◎ Target market

- Semiconductor

 

MEERE COMPANY Semiconductor Equipment  3MEERE COMPANY Semiconductor Equipment  4

◎ Main features

- DRAM, SRAM Link-Processing
- Wafer Size : 200mm ~ 400mm
- Excellent laser processing capacity
- Precise Align & Inspection System

◎ Main uses 

- Repair system to replace defective cells with spare ones by cutting links connected to them in order to save the defective chips using laser pulse through Wafer Level Test

◎ Target market

- DRAM, SRAM

◎ Main technology

- Laser Beam Shaping / Delivery 
- Laser Power precise control 
- Optical design for high speed/precise processing 
- Air-Bearing Stage control for high speed/precise processing

 

◎ Main features

- Measure thickness of thin film using Reflectometry
- Materialize high speed image
- S/W to analyze 3D Imaging
- Stabilize measure and equipment
- Compact equipment

◎ Main uses 

- Transparent/semi-transparent film that needs to be measured with nm thickness
- Each film thickness gauge

◎ Target market

- FPD
- Semi-conductor
- HB LED, Solar Cell

◎ Main technology

- Optical composition to measure thin film with nm thickness 
- Ultra-precise measurement 
- GPU high speed data treatment

 

◎ Main features

- Measure surface shape of thin film using Interferometry
- Materialize high speed image
- S/W to analyze 3D Imaging
- Stabilize measure and equipment
- Compact equipment

◎ Main uses 

- Transparent/semi-transparent/non-transparent surface shape that needs to be measured with nm thickness 
- Each surface shape gauge

◎ Target market

- FPD
- Semi-conductor
- HB LED, Solar Cell

◎ Main technology

- Optical composition to measure thin film with nm thickness
- Ultra-precise measurement
- GPU high speed data treatment